Event Date: Tuesday, January 25, 2022
Time: 1:00 p.m.-5:00 p.m. EST
Understanding the origin of stress in thin films produced by physical vapor deposition (PVD) is of key importance as excessive stress levels can lead to premature failure by cracking, buckling or interfacial delamination, which compromises device durability. This webinar will provide an overview on how film stress develops during deposition, how it is affected by the main process parameters, and how to mitigate it. Selected examples from epitaxial, amorphous and polycrystalline thin films will be highlighted, with emphasis on metallic thin films. Models explaining the generation and relaxation of stress will be presented and discussed. The webinar will also cover practical aspects on how to measure stress during growth using wafer curvature methods.

Webinar Objectives/Topics

  • Present the different stress sources in PVD thin films
  • Identify the links between growth stages and intrinsic stress evolution during polycrystalline film growth
  • Provide the basic concepts and underlying atomistic and microscopic mechanisms at the origin of stress generation and relaxation
  • Practical insight into stress measurement by wafer curvature method and its limitations
  • Understand the influence of microstructure (grain size, texture) and main process parameters on the stress development
  • Discuss the role of energetic species, involved during magnetron sputtering, HiPIMS or ion-beam assisted deposition, on defect incorporation and compressive stress build-up
  • Gain knowledge on stress manipulation strategies to control and engineer stress for specific applications

Event Sponsor


Gregory Abadias, Professor, Department of Physics and Mechanics of Materials, Institut Pprime, CNRS-University of Poitiers, FR


Gregory Abadias is a Professor at the Physics Department of the University of Poitiers, France. He received his Ph.D. in Materials Science in 1998 at National Polytechnic Institute of Grenoble (INPG), and he is currently Group Leader of thin films activities at CNRS Pprime Institute in Poitiers. He conducts research on a range of topics related to nanoscale thin films, including mechanical, electrical and optical properties of metallic, nitride or oxide systems, as well as hard and protective coatings in the form of nanocomposites or multilayers. His current research interests focus on the understanding of thin film growth dynamics using real-time and in situ diagnostics, and multi-scale modelling with main emphasis on the stress development during sputter-deposition of polycrystalline and epitaxial layers. He is co-author of more than 150 papers in peer-review journals and one book chapter. He is member-elected to the Scientific Council of the Physics Institute of CNRS since 2019, as well as French representative of the Surface Engineering Division of IUVSTA for 2019-2022 triennium. He has been involved in the organization of several symposia or workshops at international conferences (ICMCTF, EMRS) and serves as Editor of Surface and Coatings Technology journal since 2016.

Who Should Attend

This webinar is intended for researchers, students, technologists and others involved in the physical vapor deposition of thin films and looking to gain an understanding or broaden their knowledge on how intrinsic stress develops during thin film deposition, and how to mitigate it. This webinar will be beneficial to a large audience, from young scientists to engineers, as various aspects including basic concepts and modelling, instrumentation methods for measuring stress and strategies to control stress levels will be covered.

Webinar Cost

  • $200 (AVS Platinum Member)
  • $250 (Non-Member or AVS Gold/Silver Member)
  • $50 (Full-time Student/Requires Student I.D.)

Platform: Zoom

Times listed are Eastern Standard Time (EST)Check your timezone accordingly!

Each webinar includes a link to a pdf file of the copyrighted webinar notes. During the webinar you may ask questions. Presenter(s) will review and answer them periodically throughout the presentation. 

You must be present the day of the webinar, recorded versions will not be available.

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