AVS National Online Short Course Program Now Available!

AVS has been offering online training for technicians, scientists and engineers during COVID-19 with great success and reduced fees! If you are not able to travel due to restrictions, consider online training with us. While we hope to return to in person training AVS is bringing six (6) AVS Short Courses and our qualified instructors to you via Zoom for our AVS National Online Short Course Program!
Cost Per Course (1-Day/2-Day):

Platform: Zoom

Times listed are Eastern Standard Time (EST). Check your timezone!

Each course will include a link to a pdf file of the copyrighted course notes. During the online course you may ask questions. Instructors will review and answer them periodically throughout the course. 

You must be present the day of the course, recorded versions are not available.

Save with AVS Membership

Save $50 per AVS Webinar with an AVS Platinum Membership. The savings from just two webinars is equivalent to the price of an AVS Platinum Membership, which provides discounts on conferences/short courses as well as access to the AVS publications and technical libraries, career services, and more. Don’t miss out on these savings. Contact Angela Klink, AVS Member Services Administrator, angela@avs.org for your discount code or to upgrade to Platinum.

Event Sponsor

NEW! Online Training Sponsorship Opportunities Available

AVS Online Training has new sponsorship opportunities available. If you would like to sponsor an upcoming AVS short course program (public programs only), webinar, and/or e-Talk click here!

Plasma Etching and RIE: Fundamentals & Applications
(1 or 2 day option: Day 1-Fundamentals; Day 2-Applications)

Date: Tuesday, February 1, 2022 (Day 1: Fundamentals)
           Wednesday, February 2, 2022 (Day 2: Applications)
Time: 10:00 a.m.-5:00 p.m. EST
Course Objectives
  • Know the basic concepts of plasma etching.
  • Understand the physics of RF glow discharges (both high and low density).
  • Understand the surface science aspects of reactive ion etching (RIE).
  • Learn about plasma-surface chemistry leading to etching.
  • Recognize the factors that influence etching anisotropy.

Randy Shul
Technical Staff (Retired)
Sandia National Laboratories

Basics of Radio Frequency Technology (1-day)

Date: Thursday, February 3, 2022
Time: 10:00 a.m.-5:00 p.m. EST
Course Objectives
  • Understand the radio frequency (RF) plasma system as an electronic circuit.
  • Learn a systematic approach to viewing a RF plasma system.
  • Know techniques for maintaining and troubleshooting RF systems.

John Caughman
Senior Staff, Oak Ridge National Laboratory

Partial Pressure Analysis with Residual Gas Analyzers

Date: Friday, February 4, 2022
Time: 10:00 a.m.-5:00 p.m. EST
Course Objectives
  • Basic operation principles of mass spectrometers for residual gas analysis.
  • How to specify the best RGA system configuration for your application.
  • How to configure RGA software and process control I/O to perform gas analysis and track real-time changes in gas composition. 
  • Routine maintenance, tuning and calibration procedures.
  • Quantitative compositional analysis and process control (actionable information) options.
  • Spectral Interpretation: Quickly and effectively interpret typical RGA spectra. Monitor the quality of your vacuum process. Fingerprint your gas chamber. Chamber matching opportunities.
  • How to differentiate between background and process gases 
  • Typical chemical interactions between RGAs and sampled gases.

Gerardo Brucker

Chief Scientist and CTO
Granville-Phillips Division of MKS Instruments

Atomic Layer Etching

Date: Tuesday, February 8, 2022
Time: 10:00 a.m.-5:00 p.m. EST
Course Objectives
  • Learn the fundamentals of ALE based on sequential self-limiting reactions.
  • Understand the differences between plasma ALE and thermal ALE.
  • Learn about the surface chemistry and reactors for ALE.
  • Understand why plasma ALE can obtain atomic layer precise anisotropic etching.
  • Learn how thermal ALE can achieve atomic layer precise isotropic etching.
  • Learn how ALE can be utilized for thin film nanoengineering and device fabrication.
  • Understand the many current and potential applications of ALE.

Steve George

Professor, Dept. of Chemistry and Biochemistry
University of Colorado at Boulder

Plasma-Enhanced CVD: Fundamentals, Applications & Techniques (1 day)

Date: Thursday, February 10, 2022
Time: 10:00 a.m.-5:00 p.m. EST
Course Objectives
  • Learn why, where and how PECVD is used in industrial applications ranging from solar photovoltaics and semiconductors to hard coatings.
  • Understand how the process variables affect the properties of materials and device performance.
  • Learn and understand the basics of plasma equipment design and operation.
  • Get a broad overview of current manufacturing equipment and fabrication processes.

Robert Grubbs
Research Scientist
Micron Technology

UHV Design and Practices

Date: Friday, February 11, 2022
Time: 10:00 a.m.-5:00 p.m. EST
Course Objectives
  • Understand the pump factors that limit ultimate pressure.
  • Know the degassing methods that minimize the total outgassing rate.
  • Learn how to measure total and partial pressures in UHV.
  • Learn the operating methods necessary to maintain UHV.

Michael Bagge-Hansen
Staff Scientist
Lawrence Livermore National Laboratory

Other AVS Events

AVS Courses by Request

If you are interested in seeing an AVS Short Course offered in 2022 please complete the AVS Courses by Request form.

AVS Onsite/Online Training
Do your employees need training now? Are budgets tight? Let AVS bring our short courses and qualified instructors to your organization during these tough economic times via Zoom. Please complete the AVS Onsite/Online Training request form to receive a proposal.


Atomic Layer Deposition from an Applications Perspective
February 9, 2022
1:00 PM - 5:00 PM
Instructor(s): Erwin Kessels

AVS e-Talk: Measuring Your Level of Vacuum: A Guide to Gauge Technology
March 29, 2022
1:00-2:00 p.m. EDT
Presenter: Evan Sawyer