Overview

Date: Tuesday, January 26, 2021
Time: 1:00 p.m.-5:00 p.m. EST
Advanced MRAM consists of dense arrays of millions to billions of nano-pillars patterned from magnetic tunnel junction thin films, each with a diameter of 20-100nm. In common integration schemes, each nanopillar is electrically connected to a bottom and a top electrode with a pillar pitch of <500nm. The advanced magnetic tunnel junction (MTJ) thin film itself consists of more than 10 single layers with individual thicknesses down to a few Angstroms in certain cases. Combining the relatively complicated MTJ structure with specialized patterning processes is a challenge for the development of advanced MRAM. The goal of this webinar is to give an overview of the thin film growth and stack design for advanced MTJs along with basic integration process steps.

Webinar Objectives/Topics

  • Learn concepts of thin film engineering for perpendicular magnetized magnetic tunnel junctions
  • Magneto-statics: how to grow a magnetic material with perpendicular magnetic anisotropy and how to balance magnetic stray fields for patterned devices – interface magnetism
  • Understanding of tunnel magnetoresistance and the CoFeB|MgO|CoFeB system
  • Learn about basic integration schemes for building MRAM arrays in the back-end-of-line (BEOL)
  • Gain an overview over the most important unit processing steps for patterning MTJ thin films into nanopillar arrays, ion-beam etching (IBE) and reactive ion etching (RIE) as well as passivation of nano-pillar sidewalls through encapsulation, avoiding short in pillar devices

Presenters

Matthias Gottwald
MRAM Materials
IBM T.J. Watson Research Center

Michael Rizzolo 
MRAM Process Integration
IBM at Albany Nanotech

Who Should Attend

This webinar is intended for researchers, students, technologists and others who want to get involved into the research, development and fabrication of MRAM. The course will cover the basics of magnetic thin film tunnel junctions as well as the basic processes needed to integrate these films into memory arrays. The course will be beneficial to an audience aiming to expand their skills about the fabrication of MRAM and who comes from a background of thin film deposition or CMOS integration.

Webinar Cost

Cost:

Platform: Zoom

Times listed are Eastern Standard Time (EST). Check your timezone accordingly!

Each webinar includes a link to a pdf file of the copyrighted webinar notes. During the webinar you may ask questions. Presenters will review and answer them periodically throughout the presentation. 

You must be present the day of the webinar, recorded versions will not be available.

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Other AVS Events

AVS 2021 Short Course, Webinar and e-Talk Schedule

AVS 2021 Short Course programs (Chapter, National, Webinars, and e-Talks) will be posted on the AVS Short Schedule page as they become available. Please bookmark the webpage to view upcoming training opportunities.

 

AVS Webinar: Plasma-Assisted Atomic Layer Deposition: From Basics to Applications
February 10, 2021
1:00 p.m. - 5:00 p.m. EST
Instructor: Erwin Kessels
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AVS Webinar: Characterization of Thin Film Systems for Flexible Application
March 2, 2021
1:00 p.m. - 5:00 p.m. EST
Instructors: Megan J. Cordill and ​​Christian Mitterer
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AVS Webinar: Gallium Oxide Materials and Devices for Next Generation Ultra-Wide Bandgap Electronics
April 8, 2021
1:00 p.m.-5:00 p.m. EDT
Instructor: Sriram Krishnamoorthy
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AVS Online Short Course: Plasma Etching and RIE
February 23, 2021
10:00 a.m.-5:00 p.m. EST
Instructor: Randy Shul
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AVS Online Short Course: Vacuum Pumps: An Introduction to their Operation and Maintenance
February 24, 2021
10:00 a.m.-5:00 p.m. EST
Instructor: Tim Gessert
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AVS Online Short Course: Sputter Deposition
February 26, 2021
10:00 a.m.-5:00 p.m. EST
Instructor: Angus Rockett
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