Event Date: Wednesday, February 9, 2022
Time: 1:00 p.m.-5:00 p.m. EST
Over the last two decades Atomic Layer Deposition (ALD) has become a key enabling method with a multitude of applications benefiting from the (ultra)thin films that can be prepared with precise thickness control and with unparalleled uniformity and conformality on substrates with a demanding surface topology. In this webinar the method of ALD will be presented with a focus on various applications of ALD: both in the lab and in the fab; from high volume manufacturing to niche markets;  from emerging technologies to proof-of-concepts. Special attention will be given to the key features that ALD provides for these specific applications as well as the associated ALD configurations and types of equipment. Application fields that will be addressed include logic and memory devices; advanced patterning applications; power electronics; sensors and detectors; micro-electromechanical systems (MEMS); optics and photonics; photovoltaics; displays; encapsulation and surface engineering technologies; optical, decorative, biomedical, anti-corrosion, and other protective coatings; catalysis and electrochemistry; quantum technology, etc.

Webinar Objectives/Topics

  • Present the basic concepts of ALD and its various configurations
  • Provide an overview of ALD materials and type of ALD equipment
  • Present applications of ALD in the semiconductor industry, including in logic, memory and patterning
  • Give an insight into applications of ALD in other (emerging) high volume manufacturing markets including photovoltaics, battery technology, displays, etc.
  • Discuss many other applications of ALD in niche markets and in research labs: from protective to optical coatings and from biomedical applications to catalysis and quantum technology

Event Sponsor


Erwin Kessels, Professor, Department of Applied Physics 
Eindhoven University of Technology, The Netherlands


Erwin Kessels is a professor at the Eindhoven University of Technology TU/e and he is the scientific director of the NanoLab@TU/e clean room facilities. Erwin received his M.Sc. and Ph.D. degree in Applied Physics from the TU/e in 1996 and 2000, respectively. His research interests cover the field of synthesis of ultrathin films and nanostructures using methods such as (plasma-enhanced)  atomic layer deposition (ALD) and atomic layer etching (ALE). He has contributed most prominently by his work on plasma-assisted ALD, his research related to ALD for photovoltaics, and ALD for nanopatterning (including area-selective ALD). Erwin has won several awards (the AVS Peter Mark Memorial Award in 2007; the ALD Innovation Award in 2019) and he has organized various conferences in the field of ALD and ALE. He is an associate editor of the Journal of Vacuum Science and Technology. He is also the driving force behind the AtomicLimits.com blog and the founder of the ALD Academy.

Who Should Attend

This webinar is intended for researchers, students, technologists and others involved or interested in thin films and atomic layer deposition (ALD) who would like to obtain an overview of the many applications of ALD and the unique features it provides for these applications. The webinar will be valuable for a large audience including advanced users of ALD as well as newcomers to the field.  

Webinar Cost

  • $200 (AVS Platinum Member)
  • $250 (Non-Member or AVS Gold/Silver Member)
  • $50 (Full-time Student/Requires Student I.D.)

Platform: Zoom

Times listed are Eastern Standard Time (EST)Check your timezone accordingly!

Each webinar includes a link to a pdf file of the copyrighted webinar notes. During the webinar you may ask questions. Presenter(s) will review and answer them periodically throughout the presentation. 

You must be present the day of the webinar, recorded versions will not be available.

Save with AVS Membership

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Questions about Membership: Contact Angela Klink, AVS Member Services Administrator, angela@avs.org for more details.

NEW! AVS Online Training Sponsorship Opportunities Available

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Other AVS Events

AVS Online Short Course Program
February 1-11, 2022
10:00 a.m.-5:00 p.m. EST
Platform: Zoom

  • Plasma Etching and RIE: Fundamentals and Applications
  • Basics of Radio Frequency Technology
  • Partial Pressure Analysis with Residucal Gas Analyzers
  • Atomic Layer Etching
  • Plasma-Enhanced CVD: Fundamentals, Techniques and Applications
  • UHV Design and Practices


AVS Courses by Request
If you are interested in seeing an AVS Short Course offered in 2022 please complete the AVS Courses by Request form.


AVS Onsite/Online Training

Do your employees need training now? Are budgets tight? Let AVS bring our short courses and qualified instructors to your organization during these tough economic times via Zoom. Please complete the AVS Onsite/Online Training request form to receive a proposal.

AVS e-Talk: Measuring Your Level of Vacuum: A Guide to Gauge Technology
March 29, 2022
1:00-2:00 p.m. EDT
Presenter: Evan Sawyer