• $250 (AVS Platinum Member)
• $300 (AVS Gold or Silver Member-Click Here to Upgrade to Platinum Now and Save All Year)
• $300 (Non-Member)
• $50 (Full-time Student/Requires Student I.D.)

This webinar is intended for researchers, students, technologists and others involved in the physical vapor deposition of thin films and looking to gain an understanding or broaden their knowledge on how intrinsic stress develops during thin film deposition, and how to mitigate it. The course will be beneficial to a large audience, from young scientists to engineers, as various aspects including basic concepts and modelling, instrumentation methods for measuring stress and strategies to control stress levels will be covered.

Gregory Abadias, Professor
Physics and Materials Science Department
Institut Pprime, Université de Poitiers Chasseneuil-Futuroscope, FR

Webinar Objectives

• Learn the different stress sources in PVD thin films
• Identify the links between growth stages and intrinsic stress evolution during polycrystalline film growth
• Provide the basic concepts and underlying atomistic and microscopic mechanisms at the origin of stress generation and relaxation
• Determination of residual stress by wafer curvature or depth-resolved techniques (XRD, FIB-DIC) and their limitations
• Understand the influence of microstructure (grain size, texture) and main process parameters on the stress development
• Understand the role of energetic species, involved during magnetron sputtering, HiPIMS or ion-beam assisted deposition, on defect incorporation and compressive stress build-up
• Gain knowledge on stress manipulation strategies to control and engineer stress for specific applications