Date: Wednesday, March 11, 2020
Time: 1:00 p.m.-5:00 p.m. EDT
This webinar will develop a basic understanding of the Atomic Layer Deposition (ALD) technique and apply that to the detailed understanding of the ALD chemistry of oxides, nitrides, sulfides and metals. Precursor requirements and various ALD reactor configurations will be reviewed.  Measuring ALD growth rates, monitoring ALD chemistry and analyzing thin film properties through in-situ and ex-situ based techniques will be covered.  This webinar will survey the applications of ALD in semiconductor microelectronics, composite structures for X-ray optics, coatings for MEMS devices, and diffusion barriers for corrosion resistance in polymer electronics. Potential avenues and recent developments of ALD research will be covered.

Who Should Attend

Technicians, engineers and scientists who either have an interest or need to learn about the basic principles of ALD or a desire to keep up to date or broaden their knowledge of this rapidly expanding technique of thin film deposition.

Save with AVS Membership

Save $50 per AVS Webinar with an AVS Platinum Membership. The savings from just two webinars is equivalent to the price of an AVS Platinum Membership, which provides discounts on conferences/short courses as well as access to the AVS publications and technical libraries, career services, and more. Don’t miss out on these savings. Contact Angela Klink, AVS Membership Administrator, angela@avs.org, for your discount code or to upgrade to Platinum.


Webinar Objectives

To provide a detailed description of different ALD processes including advantages and limitations of ALD, ALD materials depositions and applications. The webinar will include specific examples of ALD both in the semiconductor industry and in more exotic technologies.

  • The surface science and vacuum science required to quantify the ALD process.
  • The fundamentals of ALD including advantages and limitations.
  • The similarities and differences between CVD and ALD.
  • About ideal and non-ideal ALD and thermal and plasma-enhanced ALD.
  • The limitations of ALD and the precursor requirements.
  • ALD reactor design and process requirements.
  • Leak detection equipment and best known practices.
  • How ALD is applied to semiconductor processing.
  • Recent developments in ALD applications.

Other AVS Events

AVS 2020 Short Course programs (Chapter, National, and Webinars) will be posted on the AVS Short Schedule page as they become available. Please bookmark the webpage to view upcoming training opportunities.
ICMCTF 2020 Short Course Program
Town & Country Resort Hotel and Convention Center
San Diego, CA
April 26-May 1, 2020
For Course Schedule and Registration visit www.icmctf2020.avs.org/.
AVS Courses by Request
If you are interested in seeing an AVS Short Course offered in 2020 please complete the AVS Courses by Request form.
AVS Onsite Training
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