AVS Mid-Atlantic Chapter Short Course Program
Atomic Layer Deposition
- Learn the fundamentals of ALD based on sequential self-limiting surface reactions.
- Understand the important advantages of ALD and comparison with CVD.
- Learn about ideal and non-ideal ALD and thermal and plasma-enhanced ALD.
- Understand how ALD surface chemistry and growth are studied using in situ probes.
- Learn how ALD can be utilized for thin film nanoengineering.
- Understand the many current and potential applications of ALD.
This course develops an understanding of atomic layer deposition (ALD). Al2O3 ALD is first introduced as an ideal model system and then ALD is compared with CVD. Non-ideal ALD behavior is presented before discussing plasma and radical-enhanced ALD. Subsequently, novel surface chemistry is described for metal ALD.
The course reviews the important topic of nucleation and growth during ALD before introducing low temperature ALD. ALD on polymers and ALD on particles are then discussed to illustrate some potential new application areas for ALD. ALD on porous substrates is reviewed to illustrate how ALD can deposit conformally on high aspect ratio structures. The ALD of nanolaminates and composites is then discussed to demonstrate the potential of ALD for thin film nanoengineering.
Who Should Attend?
This course is intended for engineers, technicians, marketing and sales people, or anyone involved in the microelectronics industry who wants a greater understanding of the microelectronic manufacturing.
Professor, Dept. of Chemistry and Biochemistry
University of Colorado at Boulder
Steven M. George is a Professor in the Department of Chemistry and Biochemistry at the University of Colorado at Boulder. He received his B.S. in Chemistry from Yale University and his Ph.D. in Chemistry from the University of California at Berkeley. Dr. George is directing a research effort focusing on atomic layer deposition (ALD), atomic layer etching (ALE) and molecular layer deposition (MLD). This research is examining new surface chemistry, measuring thin film growth and etching rates, and developing new applications and reactors for ALD, ALE and MLD. Dr. George has more than 450 publications in the areas of thin film growth and etching, surface science, and physical chemistry. In addition, he currently has 24 issued U.S. or PCT patents and 8 U.S. or PCT patent applications undergoing review. Dr. George has received a number of awards including the John A. Thornton Memorial Award from the AVS (2017) and the ALD Innovation Award from the AVS International Conference on Atomic Layer Deposition (2013). Dr. George is a Fellow of the AVS (2000) and the APS (1997). He has been very active in the AVS and served as AVS President (2014). Dr. George chaired the first AVS International Conference on Atomic Layer Deposition (2001). He also co-chaired the 4th International Atomic Layer Etching Workshop (2017). Dr. George is also a co-founder of ALD NanoSolutions, Inc., a company that has worked to commercialize ALD technology. ALD NanoSolutions merged with Forge Nano in February 2020.
Cost Per Course
- $350 (AVS Platinum Member)
- $400 (AVS Gold or Silver Member-Click Here to Upgrade to Platinum Now and Save All Year)
- $400 (Non-Member)
- $200 (Full-time Student/Requires Student I.D.)
Times listed are Eastern Standard Time (EST). Check your timezone!
This course will include a link to a PDF file of the copyrighted course notes. During the online course you may ask questions. The Instructor will review and answer them periodically throughout the course.
You must be present the day of the course, recorded versions are not available.
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