Area Selective Deposition Workshop 2027 will provide an international forum for researchers from academia, industry, and national laboratories to discuss advances in area-selective deposition and related selective processing. The workshop will focus on the surface chemistry, nucleation control, inhibition, activation, selective etching, metrology, modeling, and integration strategies needed to enable bottom-up fabrication for Ångström-era semiconductor manufacturing and emerging nanoscale technologies.
Building on the tradition of previous ASD workshops, the program will feature tutorials, invited and contributed talks, poster sessions, and focused discussions designed to promote exchange across disciplines and career stages, connecting early-career researchers, established scientists, equipment suppliers, materials providers, and device manufacturers.